Journal Of Vacuum Science & Technology A

Rapid atomic layer etching of Al2O3 using sequential exposures of hydrogen fluoride and trimethylaluminum with no purging

High-rate sputter deposition of electrochromic nickel oxide thin films using substrate cooling and water vapor injection

Real-time in situ ellipsometric monitoring of aluminum nitride film growth via hollow-cathode plasma-assisted atomic layer deposition

Downstream etching of silicon nitride using continuous-wave and pulsed remote plasma sources sustained in Ar/NF3/O-2 mixtures

Chemistry and kinetics governing hydride/chloride chemical vapor deposition of epitaxial Ge1-xSnx

Seamless fill of deep trenches by chemical vapor deposition: Use of a molecular growth inhibitor to eliminate pinch-off

Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma

Study of Ge-rich GeSbTe etching process with different halogen plasmas

Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature

Review Article: Quantum-based vacuum metrology at the National Institute of Standards and Technology