Journal Of Photopolymer Science And Technology

Sensitizer for EUV Chemically Amplified Resist: Metal versus Halogen

Molecular Design and Device Design to Improve Stabilities of Organic Light-Emitting Diodes

Fabrication of Mesoscopic Structure on PMMA Surface by Atomic Hydrogen and Evaluation of the Surface Functionality

Reactive Monolayers in Directed Additive Manufacturing - Area Selective Atomic Layer Deposition

Conductive Micropatterns Prepared by Laser-Induced Reduction of Graphene Oxide

Development and Optimization of UV-Induced Chemical Foaming Process

Thermally Stable and Transparent Polyketones Having 3-Adamantanedimethylene Moiety

Photoconductivity of Pb-Sn Perovskite Induced by UV Pump and IR Push Pulses

Relationship between Resolution Blur and Shot Noise in Line Edge Roughness Formation of Chemically Amplified Resists Used for Extreme-Ultraviolet Lithography

Computational Study of Pattern Formation in UV Nanoimprint Lithography