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Plasma Chemistry And Plasma Processing

Plasma Chemistry And Plasma Processing杂志,由Springer US出版,于1981年创刊,Quarterly,出版语言English,ISSN:0272-4324,E-ISSN:1572-8986。

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Plasma Chemistry And Plasma Processing
Plasma Chemistry And Plasma Processing
Plasma Chemistry And Plasma Processing
SCI SCIE EI

发文地区与机构

近年国家 / 地区发文量统计

国家 / 地区 发文量
CHINA MAINLAND 70
Russia 37
USA 29
France 26
GERMANY (FED REP GER) 21
Czech Republic 15
Iran 14
India 12
Japan 12
Poland 11

文章引用情况

1
Non-linear Compensated Dwell Time for Efficient Fused Silica Surface Figuring Using Inductively Coupled Plasma

引用次数:4

2
Plasma Induced Addition of Active Functional Groups to Biochar for Elemental Mercury Removal

引用次数:4

3
1D Modeling of the Microwave Discharge in Liquid n-Heptane Including Production of Carbonaceous Particles

引用次数:4

4
Impact of Argon in Reforming of (CH4 + CO2) in Surface Dielectric Barrier Discharge Reactor to Produce Syngas and Liquid Fuels

引用次数:4

5
Hybrid Numerical Simulation of Decomposition of SF6 Under Negative DC Partial Discharge Process

引用次数:4

6
Improved Performance for Toluene Abatement in a Continuous-Flow Pulsed Sliding Discharge Reactor Based on Three-Electrode Configuration

引用次数:4

7
Peculiarities of Si and SiO2 Etching Kinetics in HBr+Cl-2+O-2 Inductively Coupled Plasma

引用次数:4

8
A Novel ICP Torch with Conical Geometry

引用次数:4

9
Nitrogen-Doped Titanium Dioxide Thin Films Formation on the Surface of PLLA Electrospun Microfibers Scaffold by Reactive Magnetron Sputtering Method

引用次数:4

10
Spatial-Temporal Evolution of a Radial Plasma Jet Array and Its Interaction with Material

引用次数:3